专利名称：PHOTOACTIVE RESINS, RADIATION
CURABLE COMPOSITIONS AND RADIATIONCURABLE INKS
发明人：GAUDL, Kai-uwe,DIEKER, Juergen申请号：EP12799020.8申请日：20121129公开号：EP2785754A1公开日：20141008
摘要：The present invention is directed to photoactive resins employed in radiationcurable compositions and ink. The radiation curable compositions include mono or multi-functional acrylates, an amine and the above-mentioned photoactive resin. Radiationcurable inks at least include the components of the radiation curable composition inaddition to colorants.
申请人：Sun Chemical Corporation
地址：35 Waterview Blvd. Parsippany, NJ 07054 US
国籍：US
代理机构：Fuchs Patentanwälte Partnerschaft mbB
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