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Nitride semiconductor laser device

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专利内容由知识产权出版社提供

专利名称:Nitride semiconductor laser device发明人:Shinichi Kohda申请号:US12344343申请日:20081226公开号:US07876798B2公开日:20110125

专利附图:

摘要:A nitride semiconductor laser device is formed by growing a group III nitridesemiconductor multilayer structure on a substrate containing no Al. The group III nitridesemiconductor multilayer structure forms a structure including an n-type semiconductorlayer, a p-type semiconductor layer, and a light emitting layer held between the n-type

semiconductor layer and the p-type semiconductor layer. The n-type semiconductorlayer includes an n-type cladding layer containing Al and an n-type guide layer having asmaller band gap than the n-type cladding layer. The p-type semiconductor layerincludes a p-type cladding layer containing Al and a p-type guide layer having a smallerband gap than the p-type cladding layer. A removal region is formed by partiallyremoving the layers containing Al in the group III nitride semiconductor multilayerstructure from the substrate.

申请人:Shinichi Kohda

地址:Kyoto JP

国籍:JP

代理机构:Rabin & Berdo, PC

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