Device for heating a substrate

专利名称：Device for heating a substrate发明人：Gerard Kaper,Wiro Rudolf Zijlmans申请号：US143730申请日：20121025公开号：US10014433B2公开日：20180703

专利附图：

摘要：A device for heating a substrate according to a predetermined temperatureprofile for crystallizing a material on the substrate includes: a housing, at least a processchamber situated inside the housing and provided with a first and second opening forpassing through a substrate, an inlet for introducing a process gas which includes the

material in vapor phase into the chamber, at least two transport rollers attached to thehousing for transporting the substrate into the chamber. The device further includespassage spaces for preventing the escape of process gas from the chamber to a spacebetween the chamber and housing, which are situated near respective ends of thetransport rollers in the chamber, the respective passage spaces having a first passageopening on an inner wall of the chamber, a second passage opening on an outer wall ofthe chamber and a first flange fixed around the transport roller.

申请人：SMIT OVENS B.V.

地址：Son NL

国籍：NL

代理机构：Young & Thompson

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