专利名称：Apparatus for measuring the beam current
of charged particle beam
发明人：Wen-Chuang Ko,Erich Sawatzky申请号：US05/629181申请日：19751105公开号：US04011449A公开日：19770308
摘要：In an ion implantation apparatus, a structure for measuring the beam current atthe target wherein a Faraday Cage is formed by walls adjacent to and electricallyinsulated from the target in combination with the target, means for biasing the target ata negative potential, means for biasing the walls at ground potential and means formeasuring the target current and the wall current and for combining the two to providean accurate beam current measurement.
申请人：IBM CORPORATION
代理人：J. B. Kraft
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