Integrated mask-programmable logic devices with mu

专利名称：Integrated mask-programmable logic

devices with multiple metal levels andmanufacturing process thereof

发明人：Patrik Vacula,Milos Vacula,Milan Lzicar申请号：US12343621申请日：20081224公开号：US08134187B2公开日：20120313

专利附图：

摘要：Integrated mask-programmable device, having a plurality of metal levelsincluding a top metal level, a bottom metal level and a first intermediate metal level

formed between the top and bottom metal levels, and a plurality of via levels arrangedbetween the bottom and the first intermediate metal levels and between the firstintermediate and the top metal levels and connecting each metal level to adjacent metallevels. The plurality of metal levels forms a first, a second and at least a third terminal,the top and bottom metal levels having at least two metal regions, and the firstintermediate metal level having at least three metal regions. The first terminal isconnected to third terminal or the second terminal is connected to the third terminal bymodifying a single metal or via level.

申请人：Patrik Vacula,Milos Vacula,Milan Lzicar

地址：Humenne CZ,Humenne CZ,Jinocany CZ

国籍：CZ,CZ,CZ

代理机构：Wolf, Greenfield & Sacks, P.C.

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