Power supply unit for generating plasma and plasma

专利名称：Power supply unit for generating plasma

and plasma apparatus including the same

发明人：Jeong-Beom Lee申请号：US11054777申请日：20050209

公开号：US20050173070A1公开日：20050811

专利附图：

摘要：A power supply unit includes: a power source generating a radio frequencypower; an impedance matching box connected to the power source and matching aninternal impedance of the power source and a load impedance; a first feed line connected

to the impedance matching box; a radio frequency distributing means connected to thefirst feed line; and a plasma electrode connected to the radio frequency distributingmeans, the radio frequency distributing means supplying the radio frequency power to aplurality of points of the plasma electrode.

申请人：Jeong-Beom Lee

地址：Gyeonggi-do KR

国籍：KR

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