Barrier film, organic el device, flexible substrat

专利名称：Barrier film, organic el device, flexible

substrate, and method for manufacturingbarrier film

发明人：Yuka Isaji申请号：US14768858申请日：20140523公开号：US09601718B2公开日：20170321

专利附图：

摘要：A barrier film that contains primarily silicon nitride has a total hydrogenconcentration of 3×10atoms/cmor higher and a silicon-bonded hydrogen concentration

proportion of 40% or higher, the total hydrogen concentration indicating a total of aconcentration of hydrogen bonded to silicon and a concentration of hydrogen bonded tonitrogen, and the silicon-bonded hydrogen concentration proportion indicating aproportion of the concentration of hydrogen bonded to silicon to the total hydrogenconcentration.

申请人：PANASONIC CORPORATION

地址：Osaka JP

国籍：JP

代理机构：Greenblum & Bernstein, P.L.C.

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