专利名称：Selective etching of polymeric materials
embodying silicones via reactor plasmas
发明人：Leonard Stein申请号：US05/952406申请日：19781018公开号：US04209356A公开日：19800624
摘要：Silicon is employed as a masking material for the selective plasma chemicaletching of a coating material of a polyimide-silicone copolymer disposed on selectivesurface areas of electronic devices.
申请人：GENERAL ELECTRIC
代理人：Donald M. Winegar,James C. Davis, Jr.,Leo I. MaLossi
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