专利名称：Exposure method and apparatus therefor发明人：Naomasa Shiraishi申请号：US08/957818申请日：19971027公开号：US06094305A公开日：20000725
摘要：In an exposure method of illuminating a pattern formed on a mask withillumination light from an illumination optical system, and projecting/exposing an imageof the pattern on a photosensitive substrate through a projection optical system, thepattern includes a transmission portion having a transmittance of about 1 with respect tothe illumination light and a phase shift transmission portion which provides a phasedifference of about (2n+1) &pgr; (n is an integer) with respect to the light transmittedthrough the transmission portion, and has a pattern width not more than a resolving limitof the projection optical system. The illumination light passing through a predeterminedplane which is substantially coincident with a Fourier transform plane of the mask in theillumination optical system or a conjugate plane thereto, is limited to at least one localregion having the center at a position shifted from an optical axis of the illuminationoptical system, thereby inclining the illumination light radiated on the mask at an anglecorresponding to fineness of the pattern in a predetermined direction.
申请人：NIKON CORPORATION
代理机构：Vorys, Sater, Seymour and Pease LLP
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