Interferometric system and method for measuring le

专利名称：Interferometric system and method for

measuring length

发明人：Dobbs, Michael E.申请号：EP02027222.5申请日：20021206公开号：EP1321738A2公开日：20030625

专利附图：

摘要：A spectrometer (200) may include a radiant source (210) configured to emitradiation and an optical amplifier configured to amply the radiation emitted by theradiant source to produce amplified radiation. A number of optical elements (220, 230,

240, 250) may be configured to produce an interference pattern from the amplifiedradiation. A detector (260) may detect the interference pattern and generate data fromthe interference pattern. A processor (270) may be configured to measure one or morelengths from the data.

申请人：ITT MANUFACTURING ENTERPRISES, INC.

地址：1105 North Market Street, Suite 1217 Wilmington, Delaware 19801 US

国籍：US

代理机构：Esser, Wolfgang

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