专利名称：Method for protecting write head coil
during write pole notching using ion millresistant mask formed by reactive ionetching
发明人：David P. Druist,Aron Pentek申请号：US11037405申请日：20050118
公开号：US20060156537A1公开日：20060720
专利附图：
摘要：A method for protecting a write head coil during write pole notching using ion
mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of thewrite pole is performed after depositing an ion mill-resistant material to protect the coil.
申请人：David P. Druist,Aron Pentek
地址：Santa Clara CA US,San Jose CA US
国籍：US,US
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