Apparatus and method for evaluating contamination

专利名称：Apparatus and method for evaluating

contamination caused by organic substancesdeposited on substrate surface

发明人：Hideto Takahashi,Soichiro Sakata,Katsumi

Sato

申请号：US08/658247申请日：19960604公开号：US05882938A公开日：19990316

摘要：Apparatus and a method for evaluating the contamination over the surface of asubstrate for use in manufacturing semiconductor devices, liquid crystal devices and soon, said contamination being caused by contaminants, for instance airborne organicsubstances or the equivalent in the clean room atmosphere. For evaluation, there ismeasured with passage of time in the atmosphere having a substantially constant relativehumidity the surface resistivity (R) of the substrate 104 by bringing electrodes 106 intoclose contact with an insulating film as formed on said substrate surface, or a contactangle (&agr;) of a liquid- drop 207 dropped on the substrate 206. From this

measurement, the degree of said contamination is judged by comparing the value of thesurface resistivity or contact angle as measured immediately after rinsing the substrate,with the values of the same as measured after exposing the substrate to the objectiveatmosphere to be evaluated.

申请人：TAKASAGO THERMAL ENGINEERING CO., LTD.

代理机构：Patterson Belknap Webb & Tyler, LLP

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